氮分压对钕铁硼表面直流磁控溅射沉积alnal.pdfVIP

第 23 卷 第 3 期 中 国 表 面 工 程 Vol.23 No.3 2010 年 6 月 CHINA SURFACE ENGINEERING June 2010 50 中 国 表 面 工 程 2009 年 doi: 10.3969/j.issn.1007−9289.2010.03.017 氮分压对钕铁硼表面直流磁控溅射沉积 AlN/Al 防护涂层结构和性能的影响* 李金龙，冒守栋，孙科沸，宋振纶 （中国科学院宁波材料技术与工程研究所，宁波 315201 ） 摘 要：采用直流磁控溅射在钕铁硼表面沉积 AlN/Al 双层防护薄膜来提高磁体的耐腐蚀性能。先在基体表面沉积纯 Al 薄膜，然后沉积外层 AlN 薄膜。沉积 AlN 薄膜时，改变氮气分压，研究氮分压对薄膜结构和耐腐蚀性能的影响。 结果显示，AlN 纳米颗粒形成于内层 Al 结晶体表面。氮氩分压比为 1:1 时，钕铁硼表面形成了更致密的 AlN/Al 薄膜。 膜基界面存在元素的互扩散和冶金结合。氮氩分压为 1:1 的 AlN/Al 防护薄膜具有最好的耐腐蚀性能。 关键词：NdFeB ；AlN/Al 膜；结构；腐蚀性能 中图分类号：TG174.444 文献标识码：A 文章编号：1007–9289(2010)03–0080–04 Effect of Nitrogen Partial Pressure on Structure and Properties of AlN/Al Protective Coatings on NdFeB by DC Magnetron Sputtering LI Jin–long, MAO Shou–dong, SUN Ke–fei, SONG Zhen–lun (Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201) Abstract: In order to improve the corrosion resistance of NdFeB, AlN/Al dual protective coatings were synthesized by DC magnetron sputtering. To deposit the outmost AlN layer, the nitrogen/argon mixture gas was introduced into the chamber with the ratio of 2:1, 1:1 and 1:2 for argon to nitrogen. AlN with nano–size particles forms on the inner Al crystal and the nitrogen partial pressure of 50 % leads to a denser AlN/Al coatings on NdFeB. In the interface layer between the coating and NdFeB substrate, there are a diffusion distribution and occurrence of the interfacial reaction and metallurgy bonding. At the nitrogen partial pressure of 50 %, the AlN/Al coated NdFeB has the best corrosion resistance. Key words: NdFeB; AlN/Al coatings; structure; corrosion property 0 引 言 护涂层[5] 。