Bi2MO6基半导体光催化材料的研究进展-Chinese.PDF

第 17卷第2 期 过 程 工 程 学 报 Vol.17 No.2 2017 年 4 月 The Chinese Journal of Process Engineering Apr. 2017 综 述 Bi MO 基半导体光催化材料的研究进展 2 6  胡 超， 柴文柯， 车延浩， 张 伟， 冉松林， 吕耀辉 (安徽工业大学材料科学与工程学院，安徽 马鞍山 243002) 摘 要：概述了 Bi MO (M=W, Mo)基光催化剂的基本原理和相关研究进展，分析了结构与性能的关系，详细讨论了增强其光催 2 6 化性能的措施，包括形貌调控﹑表面改性﹑掺杂及构筑复合材料等，展望了今后 Bi MO 基光催化材料的研究方向. 2 6 关键词：Bi MO ；光催化；环境净化 2 6 中图分类号：TG174 文献标识码：A 文章编号：1009606X(2017)02040408 DOI: 10.12034/j.issn.1009-606X.216320 Recent Progress on the Bi MO Based Semiconductor Photocatalytic Material 2 6 HU Chao, CHAI Wen-ke, CHE Yan-hao, ZHANG Wei, RAN Song-lin, LV Yao-hui (School of Materials Science and Engineering, Anhui University of Technology, Ma anshan, Anhui 243002, China) Abstract: A comprehensive overview on the fundamentals and recent advances of Bi MO (M=W, Mo) photocatalysts were reviewed. The 2 6 relationship of structure and property was analyzed, the strategies that have been employed to enhance their photocatalytic performance were discussed in detail, including morphology control, surface modification, doping and construction of composite material. Furthermore, the research directions of the Bi MO based photocatalytic materials were outlooked. 2