磁控溅射法制备透明导电薄膜.pptVIP

Contents Magnetron Sputtering , invented in 1970s , has become one of the most widely-used methods of thin film preparation . Due to its relatively high deposition rate and film quality , it has been successfully applied in numerous fields , such as integrated circuit process , specific functional coating materials and material modification. Hard , wear resistant coatings Low friction coatings Corrosion resistant coatings Decorative coatings Coating with specific optical , or electrical properties 1852,W.R. Grove used a tip of wire as the coating source and sputtered a deposit onto a highly polished silver surface. It is the first time that sputtering was studied. 1930s, Penning developed an “electron trap” to confine electrons near a surface using a combination of electric and magnetic fields. Early 1970s, conventional or balanced magnetron sputtering was introduced. 1985, Window and Savvides develop the concept of “unbalanced magnetron sputtering” Target is bombarded by energetic ions generated in glow discharge plasma. Target atoms are removed and then condense on the substrate. Secondary electrons are emitted and play an important role in maintaining the plasma. Growth of Film Volmer-Weber Mode Frank-van der Merwe Mode Stranski-Krastanov Mode Volmer-Weber Mode e.g. Au film on Si Frank-van der Merwe Mode e.g. Si film on Si Stranski-Krastanov Mode e.g. Ag film on Si Transparent conducting films (TCFs) have been fabricated from both inorganic and organic materials. Transparent Conductive Films Inorganic TCFs Inorganic films typically are made up of a layer of TCO (transparent conducting oxide), generally in the form of indium tin oxide (ITO), fluorine doped tin oxide (FTO), and doped zinc oxide. Organic TCFs Organic films are being developed using carbon nanotube networks and graphene, which can be fabricated to be highly transparent in the infrared, along with polymer networks such as poly(3,4 ethlyenedioxythiophene) and its deri