纳米压印技术最新进展.PDF

纳米压印技术最新进展 Obducat Technologies AB., Sweden Gang Luo, History 2016 Launch of SINDRE ® Large Area 2015 Acquire Solarsemi Gmbh 2015 Awarded by NNT for “Pioneering NIL into production” 2014 Launch and sell SINDRE ® 400 Gen2 system with UV based process 2013 Launched UV based NIL process for mass-production 2013 Sold the first SINDRE ® production system for BIO applications 2008 Sold the first SINDRE ® 400 for LED production and reached an commercial agreement concerning SINDRE ® HDD development 2007 Epistar place order on the newly launched of SINDRE ® HVM 2006 Breakthrough order for NIL production system, Samsung launches products with “Obducat Inside”, SEM “Apollo” product range is launched 2005 IPS® and STU ® introduced on the market 2004 Completed the development of process for mass-production 2002 First Asian orders for NIL and first NIL into Semiconductor area 2000 Both the first EBR and the first NIL system are sold 1999 Soft Press Key Imprint technology is Patented by Obducat 1997 Listing on the Stock Exchange and first working EBR is produced 1996 Development of Nano Imprint begins together with LTH 1989 Company is founded, aiming at replacing LBR mastering technology with EBR General company presentation - © Obducat 2017 CONFIDENTIAL One company - Two locations Obd