原子层沉积在光伏技术中的应用.docVIP

经典专科、本科、硕博、研究生、期刊毕业论文 仅供参考 精心整理 仅供参考 勿用作商业用途 原子层沉积在光伏技术中的应用 摘　　要 　　原子层沉积技术(ALD)是当前世界上迅速发展的一门薄膜材料制备技术，其对于半导体薄膜的研究具有极大促进作用。此项技术不但可以制备致密型的纳米结构，而且所制备的保形及均匀纳米结构效果也十分明显，它的优势在于可以通过自限制性反应和周期性的表面气相反应，从而将薄膜沉积厚度降低到10-1级别。因此，ALD凭借其本身所具备的特点，可以在光伏领域充分发挥其作用，比如调节表面能、制备纳米结构及新型材料，其在新型薄膜电池的研发过程中发挥了极大的作用。以下将会对ALD技术以及其在光伏领域中的具体应用进行详细的阐述，本文首先介绍了当前ALD技术在光伏领域的发展现状以及其工作原理，详细的叙述了ALD技术在各种新型电池上的具体应用，比如铜锢稼硒薄膜电池（CIGS）、硅基太阳能电池染料敏化太阳能电池（DSSCs）以及钙钛矿太阳电池等。其次，简单的介绍了此次试验所用到的ALD沉积设备和得出的试验结果，进一步检验了数据的准确性。最后，对原子层沉积功能薄膜的特点进行了概括，对ALD技术未来运用于新能源材料和器件领域的前景作出了构想。 关键词　　　原子层沉积　　自限制反应　　钝化　　太阳电池 Application of Atomic Layer Deposition in Photovoltaic Technology ABSTRACT Atomic layer deposition technology (ALD) is a new material preparation technology which is in development and has great promise for the applications in semi-conductive thin-films fabrication. This technology has a unique advantage in the preparation of dense, homogenous and conformal nanostructures and thin films. The main features of ALD include repeated gas-surface reactions and self-limiting reaction. The accuracy of thickness control can be 0.1 nanometer. Due to the advantages mentioned above, ALD has been widely used in preparation of novel thin-film solar cells and shows great potential in photovoltaics. Firstly, the development and principles of ALD technique are reviewed. We focus on the applications of ALD in the fabrication of silicon-based solar cell, CIGS thin-film solar cells, dye-sensitized solar cells and perovskite thin-film solar cells in recent years. Then, a brief introduction of a self-designed atomic layer deposition system and relevant experiment are given in this work. The reliability and repeatability are demonstrated. Finally, the characteristics and advantages of functional thin films deposited by ALD are summarized. Moreover, an outlook of the ALD technique in the field of renewable energy materials and devices is proposed. Keywords　　　Atomic layer deposition　　self-limiting reaction　　passivation　　solar cells 目 录 TOC