等离子体刻蚀工艺的研究现状和发展趋势.docVIP

等离子体刻蚀工艺的研究现状和发展趋势 摘要：目前等离子体刻蚀工艺已广泛应用于国防工业和民办企业，本文归纳了在实际应用方面的内容，介绍了从湿法刻蚀到干法刻蚀的发展历程，综述了等离子体刻蚀的研究现状，总结了等离子体刻蚀的机理，并对未来发展趋势做出了分析。 关键词：等离子体刻蚀工艺，湿法刻蚀，干法刻蚀 Abstract: At present,?the technique of plasma etching?has been widely used in national defense?industry and?private?enterprises,?this paper?sums up the?content in practical application,?introduces?the development from wet etching?to?the dry etching,?reviews the current situation of the study of plasma etching?,?summarizes the?mechanism of plasma?etching and has made the analysis?on the trend of future development. Keyword:plasma etching technology