berkley 半导体工艺讲义_11.pdfVIP

EE143 F05 Lecture 11 Photolithography Key Topics: Photo = φωs = (through) light Litho = λιθοs = stone • Resolution Graphy = γραφη = writing • Depth of Focus • Overlay Errors • Photoresist Response • E-beam and X-ray lithography 1 Professor N. Cheung, U.C. Berkeley EE143 F05 Lecture 11 2 Professor N. Cheung, U.C. Berkeley EE143 F05 Lecture 11 3 Professor N. Cheung, U.C. Berkeley EE143 F05 Lecture 11 Contact Printing hv Photo photoresist Mask Plate wafer Resolution R 0.5µm mask plate is easily damaged or accumulates defects 4 Professor N. Cheung, U.C. Berkeley EE143 F05