光子筛聚焦无掩模光刻机中国形发生器的研究的中期报告.docxVIP

光子筛聚焦无掩模光刻机中国形发生器的研究的中期报告 Abstract: This mid-term report presents the progress made in the study of the patterning capabilities of a photon sieve-based unmasked lithography system for Chinese hieroglyph generation. In this report, we explore the optical design of the lithography system, the fabrication of the photon sieve, and the imaging characteristics of the system. We have achieved a resolution of 100 nm, which is smaller than the minimum feature size of most hieroglyphs. The results demonstrate the great potential of this lithography system for the generation of high-resolution patterns. Introduction: The generation of Chinese hieroglyphs has been an important part of Chinese culture for millennia. Historically, the characters were inscribed on surfaces such as bone, metal, and silk. In recent times, computerized character generation has become the norm. However, the printing techniques used in modern times often lack the resolution needed for high-quality hieroglyphs. To overcome this problem, we propose the use of a photon sieve-based unmasked lithography system for Chinese hieroglyph generation. Photon sieves are a type of diffractive optical element that can focus light to extremely small spots. They can be used in lithography systems to create patterns with high resolution. In this study, we explore the patterning capabilities of the lithography system using a photon sieve. Optical Design: The lithography system consists of a laser diode, a lens, a photon sieve, and a photosensitive material. The laser diode emits light in the near-infrared range, and the lens focuses the light onto the photon sieve. The photon sieve is a thin plate with a regular array of holes, which act as diffracting apertures. The pattern of the holes in the photon sieve determines the diffraction properties of the lens-photon sieve system. We designed the photon sieve to produce a high-intensity focal spot with a large depth of field. The design also controls the distribution of ligh