熔丝反熔丝技术.pptVIP

AntifuseandRupture

AntifuseTechnologyONOAntifusePoly/ONO/N++HeavyasdopedPoly/N++ThicknesscontrolledbyCVDnitridePrograms~18VTypicalToxono~85?RH1280Toxono=99?R=200-500ohmsthermaloxideCVDnitridethermaloxideFOXN++PolysiliconONOTDAmorphousSiliconAntifuse‘Pancake’StackBetweenMetal2and3Designedfor3.6VOperationinSeaOfGatesFPGA‘Logic’DevicesProgramat~10V‘Substrate’DevicesProgramat~30VThickness~500-1000?R=20-100ohmsMetal-3TopElectrodeAmorphousSiliconDielectricMetal-2BottomElectrode

QuicklogicViaLinkAntifuseAntifuseCo