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- 2024-07-04 发布于广西
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铝栅PMOSFET的制造流程Step0:Startwithabaren-typesiliconwafer.NDopedSilicon1
*Step1:(layering)Growthicklayer(5000?)ofsilicondioxide(fieldoxide)toactasadopingbarrier.NDopedSiliconThickFieldOxide2
*Step2a:(patterning)Applyphotoresist.NDopedSiliconThickFieldOxidePhotoresist3
Step2b:(patterning)Exposephotoresisttocreatetemporarypatternforsource/drainregions.NDopedSiliconThickFieldOxidePhotoresistUltravioletLightPhotomask4
Source/Drain:Photomask(darkfield)ClearGlassChromiumCrossSection5
Step2c:(patterning)Developphotoresist,completingte
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