光致刻蚀应用技术.pptxVIP

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  • 2026-09-03 发布于河北
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photoresistCuInjectchemicalmaterialwhichcanreactwithCuEtchingcausedeformation

ModelfeaturesReactionratelimitedbymasstransportonetchedsurfaceMasstransferbydiffusionandconvectionDeformationcalculatedbythenormalmolarfluxonsurface,usingamovingmeshinterfaceSmalletchedcavityneedstobeintroducedingeometryfromstart

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