活性屏离子渗氮技术的研究_赵程.pdfVIP

DO I :10.13251/j .issn.0254 -6051.2004.03.001 　(青岛科技大学 等离子体表面技术研究所, 山东 青岛　266042) :, , , , , 。, Fe N , , 4 。, 。 :;; :TG156.8　　:A　　:0254-6051(2004)03-0001-04 An Investigation of Active Screen Plasma Nitriding ZHAO Cheng (T hi n Films Laborato ry, Qingdao University o Science and T echnology, Qing dao Shandong 266042, China) Abstract:A n steel cage w as inst alled in a vacuum chamber o plasma nit riding apparatus and the entire w orkload is surrounded by the cage.A high voltage cat hodic potential is applied on the cage .T here o re, it is on the active screen, rat her than on the component sur ace that the plasm a orms.Since plasma is no t ormed on the component sur ace, many problems associated w ith the conventional DC plasma nit riding can be eliminated.Ex perimental result s show that the active screen plasma nitriding can achieve similar nitriding e ect to that o DC plasma nitriding .A nd t he clu s- ters sput tered rom t he active screen are neut ral Fe N particles.T here ore, the w orktable and the parts to be t reated 4 can be placed in a loating po tential or zero potential. ey words:active screen plasm a nit riding;DC plasma nitriding;nano-clusters 　　20 60 , 。 。30 , , , 。 , , , 100V 。 , , , 。, 。, , , , 、 。, 、、, 。 。 , : 20 90 , Georges , ; “”(T hrough Cage Plasma N it rid-