Semiconductor Manufacturing Processes.ppt

  1. 1、原创力文档(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。。
  2. 2、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载
  3. 3、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
查看更多
Semiconductor Manufacturing Processes.ppt

Semiconductor Manufacturing Processes Index Overview Overview Course Overview Course Overview Index Chip manufacturing: Snap shot Scope What will / will not be covered (and to what extent) What will / will not be covered (and to what extent) References Index INTRODUCTION INTRODUCTION Schematic Process Classification General Process Grouping General Processes Grouping Process Classification Course Outline General Information General Information General Information Processes Chip Xsection- Simplified Schematic Chip - Simplified Schematic Chip - Simplified Schematic Intel 7 metal SEM (90 nm node) IBM, multi level copper wiring FEOL Processes BEOL Processes Appendix Acronyms Acronyms Acronyms Shape Definition Photo Lithography Modification Ion Implantation Diffusion Rapid Thermal Anneal (RTA) Oxidation Deposition Chemical Vapor Deposition (CVD) Physical Vapor Deposition (PVD) Removal Chemical Mechanical Polishing (CMP) Etching Shape Definition Photo Lithography Modification Anneal Deposition Chemical Vapor Deposition (CVD) Physical Vapor Deposition (PVD) Electrochemical Deposition Removal Chemical Mechanical Polishing (CMP) Etching * * Micro Electronics Fabrication Overview Relevance, compare with traditional ChemE process Opportunities Course Overview Goal, what is expected of you Quiz, assignment etc Scope Outline of the course, what is covered, what is not References Introduction Relevance: Used everywhere Fairly expensive (computers) to very cheap (watch) How is it similar to / different from ‘traditional ChemE’ process? Basic Principles are same Level of control needed is very high Individual features are small, but volume is high Need to be aware of electrical properties/behavior Developing field (processes not always ‘mature’) Short cycle time Not prevalent in India == lower exposure Job opportunities: Semiconductor Complex Limited (SCL) in Chandigarh DRDO/ISRO, BEL Research Abroad: Very Active

文档评论(0)

shengyp + 关注
实名认证
内容提供者

该用户很懒,什么也没介绍

1亿VIP精品文档

相关文档