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Effect of annealing on electron dephasing in threedimensional polycrystalline metals
Effect of annealing on electron dephasing in three-dimensional polycrystalline metals
J. J. Lin,1,∗ Y. L. Zhong,2 and T. J. Li3
1Institute of Physics, National Chiao Tung University, Hsinchu 300, Taiwan
2Department of Physics, National Tsing Hua University, Hsinchu 300, Taiwan
1 3Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan
0
0
2 several series of as-sputtered and subsequently annealed
c AuPd and Sb thick films. The low-field magnetoresis-
e We have studied the effect of thermal annealing on elec- tances of the as-sputtered samples are first measured.
tron dephasing times τφ in three-dimensional polycrystalline
D The samples are then annealed, and their magnetoresis-
metals. Measurements are performed on as-sputtered and
1 annealed AuPd and Sb thick films, using weak-localization tances measured. The annealing and magnetoresistance
2 method. In all samples, we find that τφ possesses an ex- measurement procedures are repeated a few times. τφ
tremely weak temperature dependence as T → 0. Our re- is extracted by comparing the measured magnetoresis-
]
l sults show that the effect of annealing is non-universal, and tances with the three-dimensional (3D) weak-localization
l
a it depends strongly on the amount of disorder quenched in (WL) theoretical predictions [14]. Generally, thermal an-
h the micr
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