电子束光刻Electronbeamlithographypptx.pptVIP

Electron beam lithography (EBL) Overview and resolution limit. Electron source (thermionic and field emission). Electron optics (electrostatic and magnetic lens). Aberrations (spherical, chromatic, diffraction, astigmation). EBL systems (raster/vector scan, round/shaped beam) Interaction of electrons with matter (scattering, x-ray, Auger). Proximity effect and how to reduce it. Resist contrast and sensitivity. Several popular resist materials. High resolution EBL, resolution limit. Grey-scale EBL for 3D structure fabrication. Anti-charging techniques. Electron projection and multi-beam lithogr