涂层原理介绍.pptVIP

The coating formation consists of three main phases涂层形成的三个主要阶段 Ion Plating - Electron beam vaporization, principle离子镀 － 电子束蒸发，原理 2. Arc Ion Plating (AIP) – Principle 电弧镀 － 原理 2. Arc Ion Plating (AIP) - Electric arc on a coating target 电弧镀 － 涂层靶材上的电弧 2. Arc Ion Plating (AIP) – Characteristics 电弧镀 － 特性 Most widely used technology in tool coating 在工具涂层中被广泛运用的技术 Advantages优势 High vaporization rates (rapid coating) 高蒸发率（快速涂层） High ionization 高离子化率 Relatively insensitive to soiling 对污渍反应相对迟钝 Stable processes 工艺稳定 Disadvantages 劣势 Droplets from target material are deposited at the same time 同时有靶材材料的液滴沉积 3. Magnetron Sputtering (MSIP) – Principle 磁控溅射 － 原理 3. Magnetron Sputtering (MSIP) - Influence of the magnetic field 磁控溅射 － 磁性区的影响 3. Magnetron Sputtering (MSIP) using Ar/N2 gas mixture 磁控溅射 使用Ar/N2 混合气体 Introduction of PVD coating technology PVD 涂层工艺介绍 Coating material Vaporization蒸发 Energy 能源 Output materials 需要的材料 (target, cathode, ingot, etc. 靶材，阴极，铸块) Working gas inflow 工作气体流入 1. Particle transport in the plasma 等离子环境中的粒子运动 Cold plasma 冷等离子体 Reactive gas Inflow 反应气体流入 - - - - - - + + + + + + Electrons电子 Ions离子 (+/-) Molecules 分子 Radicals 原子团 Atoms原子 2. Tool Condensation 凝结 Base material 基体材料 (substrate) Bias偏压 - 3. Three main PVD coating techniques have been established in the market市场上的三种主要的PVD涂层技术 The coating techniques are mainly characterized by the type of vaporization 涂层技术分类主要依据蒸发方式不同而分 Ion Plating离子电镀 (Balzers technique 巴尔查斯技术) Magnetron Sputtering 磁控溅射(MSIP) Arc Ion Plating电弧镀 (AIP) Coating material vaporization 涂层材料，蒸发 Ionization efficiency离子化率 Plasma等离子 / Electron beam电子束 Mechanical机械的 Electric arc电弧 50 % 5 - 10% 90 % 1. 2. 3. Technique 技术 Key properties 主要特征 Very smooth coatings, especially suitable for plastics processing 很光滑，特别适合塑料处理工艺 Relatively smooth surface, low coating temperature 相对光滑的表面，低涂层温度 Rough coating, high hardness, high adhesion 粗糙，高