真空阴极弧论文真空阴极弧制备TiAlN薄膜的工艺及性能研究（学术论文）.docVIP

真空阴极弧论文：真空阴极弧制备TiAlN薄膜的工艺及性能研究 【中文摘要】真空阴极电弧离子镀作为物理气相沉积的一种方法,尤其适用于在金属表面制备各种金属膜或化合膜,本文用该方法制备了TiAlN薄膜,并对结构和性能进行分析。TiAlN薄膜具有优良的高温耐腐蚀和抗氧化能力,,而且其具有比TiN更好的耐摩性,具有广阔的应用前景。在本文中,我们用真空阴极弧离子镀制备了不同氮气分压和不同偏压模式下的TiAlN薄膜,使用的靶材是Ti、A1合金靶,原子比Ti(50)：Al(50),基片采用不锈钢。实验中发现膜层的结构和性能随工艺参数的变化而变化,分别用XRD、SEM、AFM对膜层的元素组成、晶体结构和表面形貌进行分析,此外还分析了不同工艺参数下膜层的纳米硬度、杨氏模量和电化学腐蚀。 【英文摘要】The cathodic vacuum arc,as one of zhe physical vapourde position, it especially can be used to prepare metallic compound coatings or metal coatings with high melting Point on metal surface.TiAIN is a very promising material for wear resistant coatings because of its excellent high temperature corrosion and oxidation resistance which results in higher hardness and were resistance, in comparison to TiN.A series of titanium-aluminium-nitride (Ti-Al-N, multi-phase) films were deposited on silicon wafer and steel substrates by cathodic vacuum arc technique in N2/Ar2 gas mixtures and different negative bias voltages, using a compound Ti(50):Al(50) target. It was found that the microstructure and mechanical properties of the composite films were strongly dependent on the deposition parameters. The chemical composition, crystalline microstructure, film deposition rate and surface morphology of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscope (SEM) coupled with an energy dispersive X-ray analysis system (EDX), respectively. The hardness and Young抯 modulus, wear performance and corrosion behavior of the Ti-Al-N (multi-phase) films at different N2 partial pressure were analyzed and explained on the basis of microstructure, mechanical properties and wear mechanisms. 【关键词】真空阴极弧 薄膜 氮气分压 基底偏压 TiAlN 【英文关键词】cathodic vacuum arc film bias negative bias voltages TiAlN 【目录】真空阴极弧制备TiAlN薄膜的工艺及性能研究 摘要 4-5 ABSTRACT 5 目录 6-7 第一章 绪论 7-12 1.1 薄膜材料的特点及其分类 7 1.2 物理气相沉积(PVD) 7-9 1.3 等离子体及其在薄膜沉积中的作用 9 1.4 离子轰击在离子镀过程中的作用 9-11 1.5 本论文主要目的和内容 11-12 第二章 真空阴极弧镀膜工作原理 12-18 2.1 真空阴极弧等离