共溅射与多层膜溅射制备FePtAg颗粒膜的微观结构比较.pdfVIP

第 34 卷第 12 期 稀有金属材料与工程 飞10 1.3 4 ， No, 12 2005 年 12 月 RARE METAL MATERIALS AND ENGINEERJNG De四 mber 2005 Microstructure Comparison between C_o-Sputtered and 如lultilayer-Sputtered FePt:Ag Granular Thin Films 1 1 2 Cheng Xiaomin , Li Zuoyi , Wang Jianping (1. Hu田hong University of Science Technology, Wuhan 430074嘈 China) 。 Data Storage Institute, 117608 Singapore) Abstr8ct: Two different sputtering modes, co-sputtering and multilayer-sputterin且. were used to fabricate FePt:Ag granular thin films. It is observed by the MFM and TEM images that smaller magnetic domain pattems and grains are rnore uniformly distributed in 曲 e co-sputtered granular films compared to 皿皿ultilayer-sputtered ones. Tbis difi记rence in the microstructure is explained to be attrlbu阳 d to the more randomly distributed Ag atoms in the co-sputtered films. Further study 00 in-depth de白ects in these films confirms 由 is explanation K町 words: FePt:Ag granular films; microstructure; ?o-sputtering; multilayer-sputtering CLCnu皿ber: TB43 Document code: A Artic1e ID: 1002-185X(2005)12-1879-03 Since superparamagnetism limit was pointed out in clear to have the ef岛 cts of these two different sputtering data storage technologylll, thermal stability has become modes on the microstructures of granu1ar type magnetic one of the main concerns in the research on magnetic thin films thin film recording mediaI2,I. Combining the advantages 1 E直periments of large magnetic anisotropy energy ( I