Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers 英文论文文献.docVIP

Engineering Letters, 16:2, EL_16_2_07 ______________________________________________________________________________________ Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers Nobuhiko P. Kobayashi and R. Stanley Williams we describe the growth of aluminum oxide (AlOx) on Abstract— We describe the growth of aluminum oxide (AlOx) on strong hydrophobic surfaces that consist of CH3-terminated self-assembled monolayers (CH3-SAMs) by utilizing atomic layer deposition (ALD) with H2O as the oxygen source. The evolution of