曝光与蚀刻实验.PPT

紫外曝光與蝕刻實驗 紫外曝光與蝕刻實驗 實驗有缺失: 暑假當義工, 進一步加強物理與技術的訓練 暑假提供專題研究機會: 先提出實驗構想 紫外光曝光 電子束曝光 全像術 光罩 光阻- 正光阻與負光阻 Directly Coupled SQUID Magnetometer Schematic diagram of the rf sputtering system used Surface morphology of an as grown YBCO film with root mean square roughness of about 8.2 ? Typical voltage-flux curve of a SQUID magnetometer at 77 K Weak Magnetic Fields * 黃啟裕: 楊昌浩: 電磁撿測實驗, 光學灌注 陳智城: 雜訊測量, 氧化物製作 星期一 黃啟裕: 吳宇正: 光學灌注, 電磁檢測 陳名傑: 雜訊測量, 氧化物製作, 磁共振, 星期三 微米與奈米科技 ● The pattern for resistivity and Hall measurements V = V3-V2→Resistance Vh = V2-V1→Hall coefficient 5 μm Superconductor (YBCO) Cross-sectional diagram of a ramp-edge superconductor/normal-metal/superconductor (SNS) junction Substrate Ag or Au Superconductor YBCO Normal Metal Barrier Insulator Geometry of a serial SQUID array with junction width 3 ?m Mask Aligner for Photolithography (in clean room, 10000 ppm) UV lamp Mask holder Sample stage Ime? Imd? Ib? V? Imd? Ime? Ib ? V? Integrated modulation coil Direct modulation Device Fabrication Step-edge Junctions and SQUID Arrays Fabrication of step-edge substrates MgO Ar+ beam (a) (b) Step-edge line MgO Surface morphology of step-edge substrates probed with atomic force microscopy AFM image of the step-edge substrate Surface morphology of MgO(100) substrate Excimer Laser System Wavelength = 248 nm Pulse Energy = 650 mJ Max. Rep. Rate = 50 Hz Average Power = 30 Watts 3-D Surface Profiler Device Characterization Surface Morphology Spatial Resolution (? 0.1 nm) PV = 1133.5 nm Ra = 50.9 nm Thickness = 237 nm Surface morphology YBa2Cu3Oy 3 cm 3.5 cm 5.3 cm Ar+O2 gas La0.7CaCa0.3MnO3 Nd0.7Sr0.3MnO3 PrBa2Cu3Oy rf sputtering gun water-cooled stainless-steel shielding sample holder shutter L. M. Wang, H. W. Yu, H. C. Yang and H. E. Horng, Physica C, 256, 57 (1996). 1?m Geometry of a serial SQUID array with junction width 3 ?m