非晶态t ibn 薄膜的制备及晶化研究 - 材料工程.pdfVIP

- - Ti B N - - T i B N Study on Synthesization and Crystallization of - - Amorphous Ti B N Thin Films ( ) ( ) Li Geyang Wang Gongyao Li engxing (T he State Key Lab of MMCs Shanghai Jiaotong University. , ) Wang JiwenWang Yongrui (The State Education Commission Open Lab. of High Temperature Materials T esting, Shanghai Jiaotong University) [ ] , Ti ( h -BN ) T i-B-N , XRD TEM , Ti -B-N Ti ( N , B) , HK 2470 ; T iN Ti ( N , B) , Ti-B -N [ Abstract ] T i-B-N films were synthesized by alternative deposition of T i and h -BN through substrate rotation in multi-target magnetron sputtering system. The microstructure and mechanical properties of films were studied by XRD, TEM and microindentor . It is shown that deposited T i-B-N films exists as amorphous Ti ( N , B) compound and the hardness reaches HK2470. After crystallization , T i-B-N films consist of Ti ( N , B) crystal existed in TiN -like structure and the hardness decreases a little. Keywords T i-B-N filmsmulti-target magnetron sputteringcrystallization , h -BN ( 4% ZrO ) ; 3 (DC) 1 2 , T i ( 99. 9% ) , T iN , - Ti T iN , TiB2 TiN , , TiN B Ti-B -N [ 1] , CVD [ 2] [ 3] Ti -B-N , , B , ( h -BN) BN , Ti T i-B-N , 2