低温放电等离子烧结法制备氮化硅陶瓷 - ingenta connect.pdfVIP

See discussions, stats, and author profiles for this publication at: /publication/262900345 Low Temperature Sintering of Silicon Nitride Ceramics by Spark Plasma Sintering Technique Article in uei Suan Jen Hsueh Pao/ Journal of the Chinese Ceramic Society · February 2011 DOI: 10.1179/174367510X12753884125406 CITATIONS READS 7 57 3 authors, including: Fei Chen Wuhan University of Technology 141 PUBLICATIONS 596 CITATIONS SEE PROFILE Some of the authors of this publication are also working on these related projects: Controllable Doping, Band Structure and Photoluminescence of Silicon Nitride Nanowires View project All content following this page was uploaded by Fei Chen on 31 January 2015. The user has requested enhancement of the downloaded file. All in-text references underlined in blue are added to the original document and are linked to publications on ResearchGate, letting you access and read them immediately. · 246 · 硅 酸 盐 学 报 2011 年 第39 卷第2 期 硅 酸 盐 学 报 Vol. 39 ，No. 2 2 0 1 1 年 2 月 JOURNAL OF THE CHINESE CERAMIC SOCIETY February ，2011 低温放电等离子烧结法制备氮化硅陶瓷 1 1 2 李家亮 ，牛金叶 ，陈 斐 (1. 山东理工大学化工学院，淄博 山东 255049 ；2. 武汉理工大学，特种功能材料技术教育部重点实验室，武汉 430070) 摘 要：分别以MgO–Al O 或MgO–AlPO 作为烧结助剂，采用放电等离子体低温快速烧结方法制备了主相为α相的Si N 陶瓷材料。采用X 射线衍 2 3 4