Enhanced step coverage by oblique angle （一步增强覆盖率由斜角）.pdfVIP

JOURNAL OF APPLIED PHYSICS 97, 124504 2005 Enhanced step coverage by oblique angle physical vapor deposition Tansel Karabacaka and Toh-Ming Lu Center for Integrated Electronics and Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590 Received 29 September 2004; accepted 26 April 2005; published online 20 June 2005 We present the use of an oblique angle physical vapor deposition OAPVD technique with substrate rotati