fabrication of cu–zn–sn–s–o thin films by the electrochemical deposition method and application to heterojunction cells制造cu-zn-sn-s-o薄膜的电化学沉积方法和应用异质结电池.pdfVIP

Hindawi Publishing Corporation International Journal of Photoenergy Volume 2012, Article ID 154704, 6 pages doi:10.1155/2012/154704 Research Article Fabrication of Cu–Zn–Sn–S–O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells Kai Yang and Masaya Ichimura Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555, Japan Correspondence should be addressed to Masaya Ichimura, ichimura.masaya@nitech.ac.jp Received 16 April 2