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SUPERIORITY OF ELECTROPOLISHING OVER (优越的电解抛光)
Particle ~ueleratars, Vol. 60, pp. 193-217 L 1998 OPA (Overseas Publishers Association) N.V.
Reprints available directly from the publisher Published by license under
Photocopying permitted by license only the Gordon and Breach Science
Publishers imprint.
Printed in India.
SUPERIORITY OF ELECTROPOLISHING
OVER CHEMICAL POLISHING ON
HIGH GRADIENTS
KENJI SAITO*, HITOSHI INOUE, EIJI KAKO,
TAKEO FUJINO, SHUICHI NOGUCHI, MASAAKI ONO
and TOSHIO SHISHIDO
High Energy Accelerator Research Organization (KEK) , 1 -1, Oho,
Tsukuba-shi, Ibaraki-ken, 305-0801 Japan
(Received in final form 15 January 1998)
Electropolishing (EP) offers a smoother surface, and that makes us expect high gradients in superconducting
niobium cavities. EP has a little bit complicated procedure and needs annealing to avoid the hydrogen
Q-disease. On the other hand, chemical polishing (CP) is easier and cheaper, so widely used in many
laboratories. For the conventional field gradients (,z~ 5 MV/m) in storage rings (TRISTAN-MR, HERA), no
difference was seen on the cavity performance between EP and CP. In the high gradients research for
TESLA, we have to establish the surface treatment method which has a high reliability on the high gradients
over than 25 MV/m and is cheaper in the preparation co
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