Electrically induced nanostructuring over large area--a new idea from concept to practice研究.pdfVIP

Electrically induced nanostructuring over large area--a new idea from concept to practice研究.pdf

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Electricallyinducednan0structuringoverlarge area anew l●n1eaInrom conceotJtJooract·i●ce LiXiangming一,DingYucheng一,ShaoJinyou一,LiuHongzhong’ (1.SchoolofMechanicalEngineering,Xi’anJiaotongUniversity,Xi’an710049,China;2.StateKeyLaboratory forManufacturingSystemsEngineering,Xi’anJiaotongUniversity,Xi’an710049,China) Abstract:Thepaperproposesanovelnano-patterningmethodcalledelectricallyinducednanostructuring,where anexternalelectricfield.insteadoftheexternalmechanicalpressure.isappliedtogeneratean electrohydrody— namicforceactingonthepolymer-airinterfacetodrivethepolymer’sflow intothemoldcavities.Thiselectri— callyinducednanostructuringmethodnolongerrequiresalargemechanicalpressureexternallyappliedforactua— tingthepolymerfillinginthemoldcavities,andhasbeenusedtosuccessfullyfabricatemicro/nanopillararraysof ahighaspectratio(upto101,whichhavebeenusuallyconsideredtobe “difficulttofabricate”byconventional moldingornanoimprintingprocesses. Keywords:nano-manufacturing;electrohydrodynamicforce;highaspectratio;nanoimprinting self-rgowthinnanoscalehavereceivedtremendousin— 1 Introduction terestsfrom researchers 】.Intheory,thebottom—uD Nano.patteming isoneoftheessentialtasksof methodcanbeusedtoachievepatternseconomically nano—scienceandnanOtechnOlOgy.Uptonow ,photo— andefficientlybycontrollingtheself-assemblyand lithography,asthemostsuccessfulandpredominant self-growth processto ofrm a strucutralpattern at nano—patterningtechnique,hasanabilitytoachievea atomicscaleormolecularscale.Thebottom.uppro— feature size scaled down to 22 am usinga strategy cess,whichhasbeenreally consideredasthebasics called immersion lithography,ascurrentlyusedfor ofrmold—ind

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