【机械毕业论文】螺杆干式真空泵设计.doc

目 录 第一章 绪论 4 1.1 课题背景及研究意义 4 1.2 螺杆真空泵在国内外的研究现状与发展方向 5 第二章 螺杆干式真空泵转子型线的研究 7 2.1 常见转子型线比较 7 2.2 多头双边对称圆弧型线 8 2.2.1转子型线要素 9 2.2.2转子型线设计原则 10 2.2.3 多头双边对称圆弧型线方程 11 第三章 螺杆干式真空泵工作原理 13 第四章 螺杆干式真空泵设计计算 15 4.1 整体结构设计 15 4.2电机的选择 16 4.3螺杆基本尺寸 16 4.4泵腔体设计 17 4.4.1理论排气量 18 4.4.2实际排气量 18 4.4.3进排气孔口 19 4.4.3.1轴向进气口 19 4.4.3.2轴向排气口 20 4.4.3泵腔体三维模型 20 4.5同步齿轮的设计计算 20 4.5.1齿轮尺寸计算 21 4.5.1齿轮强度校核 21 4.6轴的强度计算 21 4.7轴承的选用与校核 22 4.7.1轴承的选用 22 4.7.1轴承的校核计算 22 4.8键联接的设计和强度校核 23 4.8.1许用挤压应力 23 4.8.2．校核联联轴器与轴连接的键 23 4.8.3．校核联接阳极转子轴与小齿轮连接的键 23 4.8.4．校核联接大齿轮和阴极转子轴的键 23 4.9齿轮箱体的三维设计 24 4.10底座的三维设计 24 4.11螺杆干式真空泵三维装配 25 第五章 螺杆干式真空泵保养与维修 26 5.1螺杆干式真空泵保养 26 5.1.1运行检查 26 5.1.2定期检查 26 5.1.3定期检查设备的润滑 27 5.2螺杆干式真空泵的维修 27 5.2.1 排出压力和流量太低 27 5.2.2 驱动机过热 28 5.2.3 抱轴 28 5.2.4 产生噪音 28 5.2.5 没有流量 29 5.2.6 流量减少 29 结 论 30 致 谢 31 Abstract: Recently，in the semiconductor process of plasma enhanced chemical vapor deposition (PEVCD) and reactive ion etching (RIE)，in the liquid crystal display device manufacture process of etching and PLASMA CVD production, it has not only high demand of vacuum environment cleanliness, but also need to extract a huge amount of reaction-gas containing particle and dust. The conventional oil pump cant solve the problems mentioned above. The research object in this paper-dry screw vacuum pump has no operating fluid in the extracting chamber. It can guarantee space extracted and out side clean. It can extract gas containing mill dust ,corrosivity ,and poison ,because it has small gap between tooth face of male and female rotors .I have focused on there search as following .The profile research of male and female screws . The end face profile is double sides and symmetrical circles. Deduce the mathematic expression of meshing principle; establish the geometric model and deduce the equations of end face profile, then the Equations of helical tooth face .The research of geometrical properties，etc. Keywords：Dry(oil-free)vacuum pump Screw 3D  绪论 随着利学技术的发展，要求提供比较清洁真空环境的真空工艺越来越多，甚至