N含量对CN薄膜折射率的影响_乔学亮.pdfVIP

第31 卷第5 期 硅 酸 盐 学 报 Vol. 3 1, No. 5 2 0 0 3 年5 月 JOURNAL OF THE CHINESE CERAMIC SOCIETY M ay, 2003 N CN 乔学亮, 孙增辉, 程宇航, 陈建国, 熊 锋, 王洪水, 邓德圣 ( 华中科技大学塑性成型模拟及模具技术国家重点实验室, 汉 430074 : 采用射频磁控溅射法沉积了CN 薄膜, 利用XP S, XRD, FT IR 等测试手段研究了CN 薄膜的成分和结构。结果表明: CN 薄膜为非晶 结构; CN 薄膜中n ( N / n( C 随沉积室中N 浓度的增加而增大, n ( N / n ( C 最高可达到0. 33; CN 薄膜中主要含有C C, C) C, C) N , 2 2 C N , C S N 等原子基团; N 在CN 薄膜中主要起稳定sp C 的作用。利用椭圆偏振仪测量了CN 薄膜的折射率和厚度。对薄膜的折射率与N 含量之间关系的研究发现: CN 薄膜的折射率随n ( N / n ( C 的增加而减小; CN 薄膜的折射率由2. 2 减小到 1. 8。 : 氮化碳薄膜; 折射率; 结构; 射频溅射沉积 : TQ 174 : A : 0454- 5648( 2003 05- 0465- 05 INFLUENCE OF N CONTENT ON R EFRACTIVE INDEX OF CN FILMS QIAO Xueliang, SUN Zenghui , CHENG Yuhang , CHEN J ianguo, XIONG Feng, WANG Hongshui , DENG Desheng ( State Key Laboratory of Plastic Forming Simulation and Model Technology, Huazhong University of Science Technology, Wuhan 430074, China Abstr act: CN films w er e deposited by radio2frequency sputter ing technique and t he composition and structure of it w ere investigated by means of XPS, XR D and F TIR. T he refractive indexes of CN films are measured wit h ellipsometric polarimeter. The results show t hat CN films are amorphous and n( N / n ( C in films incr eases with the increase of N2 concentration in deposit ing chamb er , which can r each to n (N / n( C = 0. 33. There are radicals C C, C ) C, C ) N, C N , C S N et in the films. The sp 2 C content is stabilized with N content augment . Researching on the relation ship b etw een the refract ive index and N co