Principles of Plasma Discharges and Materials Processing第12章.pdfVIP

CHAPTER 12 INDUCTIVE DISCHARGES The limitations of capacitive rf discharges and their magnetically enhanced variants have led to the development of various low-pressure, high-density plasma discharges. The distinction between low- and high-density discharges is described in Sections 10.1 and 10.2. A few examples are shown schematically in Figure 1.14, and typical parameters are given in Table 1.1. In addition to high density and low pressure, a common feature is that the rf or microwave power is coupled to the plasma across a dielectric window or wall, rather