多晶硅生产中氯硅烷残液的资源化处理与利用-化学工程专业论文.docx

of 3500kg/h, feed location of 45th plate, distillate rate of 20kg/h for T4; reflux ratio of 8, feed position of 42th stage, bottom rate of 100kg /h for T5. The process for recovering and purifying chlorosilane residue is improving by applying the different pressure thermally coupled distillation. Components distribution, energy consumption and product purity for both conventional distillation process and different pressure thermally coupled distillation process are compared. The results showed the seperation effect of differential thermal coupling distillation process is close to the conventional distillation process, but the improved process can save energy by 20% and purity of hexachlorodisilane and silicon tetrachloride can reach 98.1 wt% and 99.5 wt% respectively. Two kinds of processes for dealing with low-temperature hydrogenation slurry, spray drying method and spin flash drying method, are compared. Advantages and disadvantages of each process are discussed. The results show that investment and cost of each process are close to each other. The biggest advantage for the spray drying method is to facilitate continuous production and for the spin flash drying method is the resolution of aluminum chloride volatile. Key words：chlorosilane residue; hexachlorodisilane; different pressure thermally coupled distillation; low-temperature hydrogenation slurry; I I 目 录 第一章 文献综述1 1.1 研究背景 1 1.1.1 多晶硅发展现状1 1.1.2 多晶硅行业存在问题1 1.2 多晶硅氯硅烷残液介绍 2 1.2.1 氯硅烷残液的组成2 1.2.2 氯硅烷残液中具有附加值组分2 1.2.3 氯硅烷残液的危害3 1.3 国内外氯硅烷残液回收处理方法及工艺 3 1.3.1 水解法3 1.3.2 过滤法6 1.3.3 干燥法7 1.3.4 燃烧法8 1.3.5 结晶法9 1.3.6 高沸物回收法9 1.4 化工过程流程的模拟 10 1.4.1 化工过程流程模拟的发展10 1.4.2 化工流程模拟软件 Aspen Plus 介绍 10 1.5 化工操作单元过程的应用 11 1.5.1 精馏操作单元的应用及优化11 1.5.2 刮板薄膜蒸发器的应用12 1.5.3 喷雾干燥技术的应用12 1.5.4 旋转闪蒸干燥器的应用12 1.6 精馏过程的节能 13 1.6.1 热泵精馏13 1.6.2 设置中间再沸器和冷凝器的精馏13 1.6.3 差压热耦合精馏技术14 1.7 本文的研究目的 15 第二章 氯硅烷残液回收提纯工艺的建立与模拟16 II II 2.1 氯硅烷残液回收提纯工艺的建立 16 2.1.1 目前残液处理工艺存在的问题16 2.1.2 进料及组成16 2.1.3 新工艺的提出17 2.2 氯硅烷残液回收