脉冲电沉积纳米晶N-iCo合金镀层热稳定性的研究.PDFVIP

52 / 2 9 4 N-i Co T hermal Stability of Pulsed Electrodeposition Nanocrystalline N-i Co Alloy Coating , , ( , 35 1 8) ZHONG Yuan-hui, DAI Pin-qiang, DAI Chun- fu ( College of M aterials Science and Engineering, Fuzhou U niversity, Fuzhou 35 1 8, China) : X (XRD) (EDS) N-i Co N-i Co , Ni-231 5% Co( ) , : , N-i Co , 25 e , N-i 231 5% Co , 131 5nm 3 e 981 5nm, 2 K # min- 1 DSC , N-i 231 5% Co 3 ~ 35 e , , 372 e , 141 22J # g- 1 DSC , Kissinger N-i 231 5% Co 2121 5kJ/ mol : ; N-i Co ; ; : T G 1721 5 : A : 1 1-4381(2 9) 4- 52- 5 Abstract: M icrostructures and composition of nanocrystalline N-i Co alloy produced by pulse electro- deposition w ere studied by XRD and EDS. The microhardness of nanocrystalline N-i Co alloy annealed at various temperatures w as measured and the thermal stability of N-i 2315% Co( mass fraction) alloy w as studied extensively. The results indicated that microhardness of N-i Co alloys increased slightly after annealing at low temperatures, and reached the maximum at 25 e , then decreased w ith the in- creasing of the annealing temperatures. T he grain size of N-i 2315%Co alloy increased from 1315nm to - 1 9815nm w hen the annealing temperature rose to 3 e . T he DSC curve obtained at 2 K # min heat- ing rate show ed low energy exotherm beginning at 3 e and continuing to 35 e at w hich point the main thermal release occurred, reaching peak differential heat flow at 372 e , the release $H w as