稳恒强磁场对A-lCu扩散偶界面中间相形成和生长的影响.PDF

A-l Cu 41 Al- Cu Effect of H igh Magnetic Field on Intermetallic Compound Layers of A-l Cu Diffusion Couple 1, 2 1, 2 2 2 , , , , ( 1 , 116085; 2 , 116085; , 100095) REN Xiao1, 2 , ZHOU Wen-long1, 2 , 2 2 CHEN Guo-qing , HU ANG Zhao-hui , ZHANG Jun-shan ( 1 State Key Laboratory of M aterials Modification by Laser, Ion and Electron Beams, Dalian U niversity of T echnology , Dalian 116085, Liaoning, China; 2 School of Materials Science and Engineering, Dalian U niversity of T echnology , Dalian 116085, Liaoning, China; Beijing Institute of Aeronautical M aterials, Beijing 100095, China) : Al-Cu : , , , , A-l Cu Al Cu , : ; A-l Cu ; ; : T G 111. 6 : A : 1001-4 81(2007) 08-004 1-04 Abstract: Interfacial intermetallic compound ( IMC) layers of Al-Cu diffusion couple under high mag- netic field w ere investigated. T he results show that high magnetic field increases the thickness of the IM C layers and the species of the IMC layers changes w ith the intensity of high magnetic field. Ac- cording to the parabolic law , the diffusion coefficients of the IMC layers w ere calculated. It can be concluded that the high magnetic field increases the diffusion coefficient, and the diffusion coefficient in the vertical directions are greater than those in the parallel ones. These results demonstrate that high magnetic field promotes the diffusion, thus enhances the formation and growth of the interfacial IM C layers