真空紫外硅闪耀光栅的制作-ResearchGate.PDF

See discussions, stats, and author profiles for this publication at: /publication/289273556 Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution Article  in  Guangxue Jingmi Gongcheng/Optics and Precision Engineering · January 2010 CITATIONS READS 2 16 5 authors, including: Bin Sheng Ye Liu University of Shanghai for Science and Technology Chinese Academy of Sciences 33 PUBLICATIONS   52 CITATIONS    29 PUBLICATIONS   75 CITATIONS    SEE PROFILE SEE PROFILE All content following this page was uploaded by Bin Sheng on 04 March 2018. The user has requested enhancement of the downloaded file. 18　 1 　 Vol.18　No.1 2010 1　 　 　　　　　　　　　Optics and Precision Engineering 　　　 　　　　　 Jan.2010 　1004-924X(2010)01-0094-06 盛　斌,徐向东,刘　颖,洪义麟,付绍军 (中国科学技术大学 国家同步辐射实验室, 安徽 合 230029) :KO , Si(111) 5°1 200 gr/mm 。, , , , 。, 0.2 nm。 , 135 nm 。X , , 。 　　:闪耀光栅;单晶硅;各向异性湿法刻蚀;真空紫外;掩模 :TN305.7;O436.1　　:A Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution S ENG Bin, XU Xiang-dong, LIU Ying, ONG Yi-lin, FU Shao-jun (N ational Sy nchrotron R adiation L aboratory , University of Science and Technology of China, Hef ei 230029, China) Abstract:In combination with holographic interfer