脉冲激光沉积钛膜的工艺与机理的研究-复合材料学专业毕业论文.docxVIP

武汉理工大学硕十学位论文Abstract 武汉理工大学硕十学位论文 Abstract Diamond film iS all excellent structural and functional material．which shOWS high hardness，low friction coefficient，hi【gll thermal conductivity,high optical transparency,low permittivity and wide band gap etc．If we deposit diamond film On surface of stainless steel，we Call give attention to toughness of stainless steel and strength，hardness and resistance to wealof diamond film．It has very widely application prospect．However,its very difficult tO directly deposit diamond film on the surface of steel substrates．Researchers usually deposit interlayers on surface of steel substrates to solve this problem． In this paper,metal titanium∞)is used interlayer to prevent graphite catalysis Of Fc．At the same time．Ti is an element which can form carbide strongly,produce interface diffusion reaction with diamond film to create TiC compound，and prevent diffusion between Fe and C．As a result，there is well chemical bond between Ti and diamond film，which Call enhance interface combination．Moreover,Ti interlayer Call produce intermetallic compounds with steel substrate，to cause substrate and interlayer good combination． Titanium(n)film is deposited by pulsed laser deposition(PLD)in this experiment．Systematically research the influence of technique parameter on structure of Ti film．XRD is used tO analysis phase structure．SEM is used to analysis surface topograph of film，Ellipsometer is used to measure film thickness，and XPS is used to analysis chemical elements and relative content ofsurface ofTi film． Compared with metal films deposited by sputter,deposition rate of metal film deposited by pulsed laser deposition(PLD)is much lower,because their deposition mechanism is different．There is certain reflection effect on metal materials toward the laser bean，and the absorption rate is low．When filled with the buffer gas argon during the experiment，crystal quality of Ti film is better than isn’t filled．The reason is that the gas molecule collides