ZrO2和ZrNx薄膜的结构形貌与润湿性研究.doc

摘 要 在各种应用领域里都需要能够承受恶劣条件的疏水材料，金属陶瓷薄膜由于本身具有的高硬度，高韧性和高熔点等特性，是非常理想的疏水材料。在金属陶瓷中，电负性较低的阳离子具有较低的路易斯酸度，从而导致其与水氧阴离子形成配位键的能力低，使其氧化物和氮化物薄膜具备较好的疏水性。 锆的氧化物及氮化物薄膜由于其优良的特性被广泛应用在各行业中。在过渡族金属中，锆具有较低的电负性，因此氧化锆及氮化锆薄膜在疏水领域中具有较大的应用前景。此外，疏水薄膜的性能也与其表面的粗糙度有关，而许多研究已表明薄膜的表面形貌与制备工艺的参数有着非常密切的关系，但是因为它们之间的关系较为复杂，因此我们要想得到性能最优的薄膜结构就需要系统地研究它们之间的关系。 到目前为止，制备氧化锆、氮化锆薄膜的方法有很多，例如脉冲激光沉积、离子束溅射沉积、磁控溅射、原子层沉积、化学气相沉积等。在磁控溅射中，有必要对溅射功率、沉积温度、溅射压强和衬底偏压等工艺参数进行系统的研究，以明确薄膜形貌与润湿性之间的关系。在本论文中，我们以在硅衬底上沉积氧化锆和氮化锆薄膜为研究对象，以射频磁控溅射技术为研究方法，研究了溅射功率、沉积温度、溅射压强、气体流量比和衬底偏压等工艺参数对薄膜的相结构、表面形貌、沉积速率和润湿性能的影响。研究表明，工艺参数的改变在一定程度上影响薄膜的表面形貌，当薄膜表面微结构凸起较大，表面平整度较差时，薄膜的疏水性最好。在此过程中，我们还发现薄膜的润湿性会随薄膜暴露在环境下的时间而变化，研究方法为将同一薄膜样品放置在固定的环境中，每隔一段时间便对其进行润湿性测试，结果表明其接触角不断升高，由超亲水向疏水转变。 关键词：磁控溅射； 氧化锆薄膜； 氮化锆薄膜； 微观结构； 润湿性能 Abstract In various application fields, hydrophobic materials that can withstand harsh conditions are required. Because of its high hardness, high toughness, and high melting point, cermet films are very ideal hydrophobic materials. In ceramics, the cations with lower electronegativity have lower Lewis acidity, which results in the lower ability to form coordination bonds with hydroxyanions, and the better hydrophobicity of oxide and nitride films. Zirconium oxide and nitride films are widely used in various industries due to their excellent characteristics. Among the transition metals, zirconium has a lower electronegativity, so zirconia and zirconium nitride films have great application prospects in the field of hydrophobicity. In addition, the properties of hydrophobic films are also related to their surface roughness. Many studies have shown that the surface morphology of the films has a very close relationship with the parameters of the preparation process, but because of the complex relationship between them, we need to systematically study the relationship between them if we want to get the thin film structure with the best performance. So far, there are many methods for preparing zirconia and zirconium nitride thin films, such as pul