氢化非晶硅膜厚分布优化及TFT性能研究.docxVIP

? ? 氢化非晶硅膜厚分布优化及TFT性能研究 ? ? Summary：氢化非晶硅薄膜因具有优良的光学特性和物理特性，被广泛应用于太阳能电池、传感器和大面积平板显示等领域。本文采用等离子增强化学气相沉积法（PECVD）在1.8m×1.5m的基板上制备非晶硅薄膜。通过调整下电极加热温差设置及电极间距（spacing）来改善膜厚分布，优化产品TFT特性。 Keys：氢化非晶硅；膜厚均一性；电极间距；PECVD Study on thickness distribution optimization and TFT characteristics of hydrogenated amorphous silicon Fang Xing1 Fu Xuequn2 Gao Pingyu3 Nanjing CEC Panda LCD Tecnology Co.,Ltd Nanjing, Jiangsu 210000 Abstract：Hydrogenated amorphous silicon thin films are widely used in solar cells, sensors and large area flat panel displays fields with their excellent optical and physical properties. In