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一个简单的65nm﹢MOSFET失配模型
I. Introduction- Background information on MOSFET and mismatch in circuits- Importance of understanding 65nm+ MOSFET mismatch modelII. Literature Review- Previous studies on MOSFET mismatch model- Different approaches to modeling MOSFET mismatch- Advantages and limitations of each approachIII. Proposed Methodology- Overview of the 65nm+ MOSFET mismatch model- Assumptions made in the model- Proposed equations and parameters for the modelIV. Results and Analysis- Simulation results using the proposed model- Comparison of simulated results with actual experimental data- Analysis of the models accuracy and limitationsV. Conclusion- Summary of key findings- Significance of the proposed model for circuit design and optimization- Future directions for research in MOSFET mismatch model.I. IntroductionThe demand for high-speed and low-power circuits has led to the development of MOSFETs with ever-decreasing dimensions. However, as the size of MOSFETs decrease, the mismatch between transistors in a circuit becomes increasingly significant. This mismatch can lead to degraded circuit performance, increased power consumption, and reduced yield in the manufacturing process. Therefore, understanding and modeling MOSFET mismatch is crucial for designing and optimizing complex integrated circuits.This paper presents a simplified model for 65nm+ MOSFET mismatch based on previous studies and established theories. The model takes into account the effects of process variation, bias condition, and temperature on MOSFET performance. By accurately characterizing the mismatch effect, our model can predict circuit performance and improve circuit design and optimization.The first section of this paper provides an overview of MOSFETs and the significance of mismatch in circuits. It highlights the challenges faced in modeling MOSFET mismatch and the importance of accurate modeling for circuit design.MOSFETs, or Metal-Oxide-Semiconductor Field-E
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