通过故障模式映射对等离子体刻蚀设备停机原因进行根本原因分析.pdf

InternationalJournalofResearchPublicationandReviews,Vol6,Issue4,pp2283-2298April2025

InternationalJournalofResearchPublicationandReviews

Journalhomepage:ISSN2582-7421

RootCauseAnalysisofDowntimeinPlasmaEtchingEquipment

throughFailureModeMapping.

NdokwuTochukwuAnthony

DepartmentofEngineeringTechnologyandIndustrialDistribution,TexasAMUniversity,CollegeStation,USA

DOI:/10.55248/gengpi.6.0425.1385

ABSTRACT

Intherealmofsemiconductormanufacturing,plasmaetchingequ