原子层沉积系统设计的研究.pdfVIP

第31卷第1期 真空科学与技术学报 OFVACUUMSCIENCEAND 2011年1、2月 C卸附ESEJOURNAL 7IEC}矾0IOGY 原子层沉积系统设计的研究 叶位彬1黄光周1’朱建明2戴晋福2 (1．华南理工大学电子与信息学院广州510640；2．广东肇庆科润真空设备有限公司肇庆526060) Resultsin ofAtomic Design Layer Preliminary DepositionSetup Ye Jinfu2 Weibinl，HuangGuangzIlouH，ZhuJianmin92，Dai (1．School and 510640，Ch／na； ofElectronicInformationEngineering，SD砒Ch／naUn／vers／tyofTechno／ogy，囟嘞u Kerun 2．ZhaoqingVacuum脚棚tCO．，LTD，Z‰q／ng526060，China) AbstractA atomic was inthe tested prototypedlayerdepositionsetupdesigned，constructed，andgrowthof她03 atomic consistsofareactor chamberswith resistive layers．The chamber，twoprecursor accessories，including set-up heatersandinletsof and／or anautomaticcontrolunit．Thecontrolunitauto— supportinggas liquid，pumpingsystem，and inthereactorand other of the chambers，and maticallyregulatestemperatures precursor parametersinterest．Highk她03 were on Sisubstrates and asthetwo mi— layers with她(CH3)3n20 depositedhydrogen-terminated precursors．The crostmcturesandelectronic ofthe werecharacterizedwithelectron and propertieslayers probemicro-analyzerX··mypho·- toelectron resultsconfirmthatthe is of atomic spectroscopy．Thepreliminary setupcapabledepositinghishquality lay