基于溶剂退火胶体晶体构筑多级有序抗反射涂层.doc

  基于溶剂退火胶体晶体构筑多级有序抗反 射涂层# 郑露，耿翀，严清峰** 5 10 15 20 25 （清华大学化学系，北京 100084） 摘要：本文报道了一种制备多级有序抗反射微纳米结构的简易方法。该方法结合胶体晶体自 组装与水气界面溶剂蒸汽退火，首先利用水气界面自组装技术制备大面积胶体微米球单层， 通过溶剂蒸气对自组装微米球单层进行退火处理，得到不同形貌的微米球阵列。将水气界面 上自组装的胶体纳米球阵列转移到该微米球阵列上，即得到多级有序的微纳米结构。光学测 试结果表明，制备的多级有序阵列在近红外波段（1100 nm-1800 nm）显示出较好的抗反射 性质。同时，溶剂蒸汽退火后，胶体微球之间的部分融合使有序结构阵列的机械强度大大提 高。与传统刻蚀技术相比，这种建立在化学自组装基础上的方法效率高、成本低，为制备大 面积抗反射涂层提供了新的思路。 关键词：胶体自组装；多级有序阵列；溶剂蒸气退火；抗反射 中图分类号：O743; O73; O77; O781; TB52; Hierarchically ordered arrays based on solvent vapor annealed colloidal monolayers for antireflective coating Zheng Lu, Geng Chong, Yan Qingfeng (Department of chemistry, Tsinghua University, Beijing 100084) Abstract: A facile strategy for fabricating hierarchically micro- and nano-scale ordered features as antireflection (AR) coating is developed. The approach is based on a combination of colloidal spheres self-assembly with solvent vapor annealing at the air/water interface. Micron colloidal spheres were firstly self-assembled into monolayer at the air/water interface. A subsquent solvent anneaing was used to manipulate the morphology of the colloidal monolayer. Deposition of a nanosphere colloidal monolayer onto the annealed microsphere colloidal monolayer resulted in a hierarchically ordered arrays. These hierarchically ordered arrays demonstrate ?ne structure-enhanced antireflection properties in the near-infrared spectral region ranging from 1100 nm to 1800 nm, which may be highly valuable for designing many optoelectronic devices. 30 35 40 Compared to conventional lithographic techniques, this new process exhibits the advantages of low cost and high efficiency. Thus, it paves a way to the fabrication of large-area AR coatings. Keywords: Colloidal self-assembly; Hierarchically ordered arrays; Solvent vapor annealing; Enhanced antireflective properties 0 引言 对于众多光电子器件如激光器、平板显示器、发光二极管来说，抗反射涂层是不可或缺 的组成部分[1-3]。多级有序结构，作为一种有效抗反射涂层，引起了全世界科学家的广泛关 注[4-6]。这些复杂而精细的结构因具备突出且独特的理化性质而在光电子器件中具有很大的 应用潜力[7]。近年来，基于金属氧化物多级有序结构的抗反射涂层的制备