氨络合物体系中杂质Zn2+对电沉积镍的影响.pdfVIP

19 11 2009 11 Vol.19 No.11 The Chinese Journal of Nonferrous Metals Nov. 2009 1004-0609(2009)11-2044-06 Zn2+ ( 310032) Zn2+Zn2+ Zn2+0.1 g/L 2.78 A/dm Zn2+0.5 g/L 640 mV Zn2+ 640 mVZn2+0.5 g/L Zn2+ 0.5 g/L Zn2+0.1 g/L TQ 53 A 2+ Effect of impurity Zn on nickel electrodeposition in solution containing ammonia complex CAO Hua-zhen, QIN Ai-ling, ZHENG Guo-qu, DU Zheng-zheng (College of Chemical Engineering and Materials Science, Zhejiang University of Technology, Hangzhou 310032, China) Abstract: In nickel ammonia system, the influence of impurity Zn2+ on the nickel electrodeposition was studied intensively by Hull Cell experiments, and the cyclic voltammetry, cathodic polarization and chronoamperometric curves were tested at different Zn2+ concentration by electrochemistry working station. The results show that nickel can be deposited normally when the concentration of impurity Zn2+ is 0.1 g/L and the cathodic current density is less than 2.78 A/dm. When the concentration of impurity Zn2+ is greater than 0.5 g/L, nickel can ’t be deposited normally in a wide range of current density. The cathodic transfer coefficient α and reaction mechanism will not change with the addition of impurity Zn2+ when the overpotential is less than 640 mV. The cathodic transfer coefficient α decreases and the reaction mechanism changes when the overpotential is greater than 640 mV and the concentration of impurity Zn2+ is greater than 0.5 g/L. The nucleation rate during nickel electrocrystallization is restrained greatly w