紫外光解法在制备低介电常数氧化硅分子筛薄膜中的应用.pdfVIP

理化学学报(Wuli Huaxue Xuebao) August A cta Phys. Chim. Sin., 2007, 23(8) ：1219-1223 1219 [Article] 紫外光解法在制备低介电常数氧化硅分子筛薄膜中的应用 昊1 李庆华1, 沙 菲2 解丽丽1 田 震1 王利军1 1 2 ( 上海第二工业大学环境工程系, 上海 201209; 上海纳米材料检测中心, 上海200237) 摘要： 以正硅酸乙酯为硅源, 四丙基氢氧化铵(TPAOH)为模板剂和碱源, 采取水热晶化技术, 通过原位法在硅 晶片表面制备出纯二氧化硅透明分子筛薄 ; 采用紫外光解法代替传统高温焙烧法脱除分子筛薄膜孔道内的模 板剂, 制备出具有低介电常数的氧化硅分子筛薄 . 使用FTIR 、XRD 和SEM 对样品进行了结构表征, 并采用阻 抗分析仪测量了薄 的介电常数, 纳米硬度计测量薄 的杨氏模量和硬度. 与传统的高温焙烧方法相比, 紫外光 解法处理条件温和, 同时省时、省能、操作简易. 关键词： 紫外光解法; 高温焙烧法; 氧化硅分子筛薄 ; 低介电常数 中图分类号： O649 Application of Ultraviolet Treatment in the Synthesis of Pure silica Zeolite Thin Films with Low Dielectric Constant YUAN Hao1 LI Qing Hua1, SHA Fei2 XIE Li Li1 TIAN Zhen1 WANG Li Jun1 1 ( Dep artment of Environmental Engineering, Shanghai Second Polytechnic University, Shanghai 201209, P. R. China; 2Shanghai Testing Center of Nanometer Materials, Shanghai 200237, P. R. China) Abstract ： Transparent pure silica zeolite (PSZ ) films were synthesized on silicon wafers through hydrothermal reaction , in which tetraethyl orthosilicate ( TEOS ) was used as silica source , tetrapropyl ammonium hydroxide (TPAOH) as template and alkaline source. An ultraviolet treatment was subsequently applied to remove the organic templates within the pores/channels of zeolite films. The thin films were characterized by using FTIR, XRD, and SEM te