半导体制备技术简介CH07.ppt

Hong Xiao, Ph. D. www2.austin.cc.tx.us/HongXiao/Book.htm Chapter 7 Plasma Basic Objectives List at least three IC processes using plasma Name three important collisions in plasma Describe mean free path Explain how plasma enhance etch and CVD processes Name two high density plasma sources Topics of Discussion What is plasma? Why use plasma? Ion bombardment Application of plasma process Applications of Plasma CVD Etch PVD Ion Implantation Photoresist strip Process chamber dry clean What Is Plasma A plasma is a ionized gas with equal numbers of positive and negative charges. A more precise definition: a plasma is a quasi-neutral gas of charged and neutral particles which exhibits collective behavior. Examples: Components of Plasma A plasma consists of neutral atoms or molecules, negative charges (electrons) and positive charges (ions) Quasi-neutral: ni ? ne Ionization rate: h ? ne/(ne + nn) Ionization Rate Ionization rate is mainly determined by electron energy in plasma In most plasma processing chambers, the ionization rate is less than 0.001%. The ionization rate of high density plasma (HDP) source is much higher, about 1%. Ionization rate in the core of sun is ~100%. Neutral Gas Density Idea gas 1 mole = 22.4 Litter = 2.24?104 cm3 1 mole = 6.62 ?1023 molecules At 1 atm, gas density is 2.96?1019 cm?3 At 1 Torr, gas density is 3.89?1016 cm?3 At 1 mTorr, gas density is 3.89?1013 cm?3 RF plasma has very low ionization rate Parallel Plate Plasma System Generation of a Plasma External power is needed Radio frequency (RF) power is the most commonly used power source Vacuum system is required to generate a stable RF plasma Ionization e + A A+ + 2 e Ionization collisions generate electrons and ions It sustains the stable plasma Illustration of Ionization Excitation-Relaxation e + A A* + e A* A + hn (Photos) Different atoms or molecules have difference frequencies, that is why different gases have different glow colors. The change of the glow colors is u