ATML #17IEEE SCC20 DMC amp; TII Jan 2006Plenary.ppt

ATML #17IEEE SCC20 DMC amp; TII Jan 2006Plenary.ppt

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ATML#17IEEESCC20DMCamp;amp;TIIJan2006Plenary.ppt

ATML #17 IEEE SCC20 DMC TII Jan 2006 Plenary Lockheed Martin Orlando The Facilities Michelle Harris Layout Facilities Emergency Procedures What you need to know Lunch 12:00 – 13:00 Coffee and Jam doughnuts Start Time 08:30 Welcome Introductions Attendance Sheet Name- Chris Gorringe Company -Racal Instruments Group Ltd. Acting chair of ATML focus group and IEEE SCC20 TII co chair. Focus is in promoting progress and maximising consensus for developing XML schemas IEEE Call For Patents Chris Gorringe Instructions for the WG Chair At Each Meeting, the Working Group Chair shall: Show slides #1 and #2 of this presentation Advise the WG membership that: The IEEE’s patent policy is consistent with the ANSI patent policy and is described in Clause 6 of the IEEE-SA Standards Board Bylaws; Early disclosure of patents which may be essential for the use of standards under development is encouraged; Disclosures made of such patents may not be exhaustive of all patents that may be essential for the use of standards under development, and that neither the IEEE, the WG, nor the WG Chairman ensure the accuracy or completeness of any disclosure or whether any disclosure is of a patent that, in fact, may be essential for the use of standards under development. Instruct the WG Secretary to record in the minutes of the relevant WG meeting: That the foregoing advice was provided and the two slides were shown; That an opportunity was provided for WG members to identify or disclose patents that the WG member believes may be essential for the use of that standard; Any responses that were given, specifically the patents and patent applications that were identified (if any) and by whom. IEEE-SA Standards Board Bylaws on Patents in Standards 6. Patents IEEE standards may include the known use of essential patents and patent applications provided the IEEE receives assurance from the patent holder or applicant with respect to patents whose infringement is, or in the case of patent ap

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