TSF_521_176-black silicon.pdfVIP

This article appeared in a journal published by Elsevier. The attached copy is furnished to the author for internal non-commercial research and education use, including for instruction at the authors institution and sharing with colleagues. Other uses, including reproduction and distribution, or selling or licensing copies, or posting to personal, institutional or third party websites are prohibited. In most cases authors are permitted to post their version of the article (e.g. in Word or Tex form) to their personal website or institutional repository. Authors requiring further information regarding Elsevier’s archiving and manuscript policies are encouraged to visit: /copyright Authors personal copy Thin Solid Films 521 (2012) 176–180 Contents lists available at SciVerse ScienceDirect Thin Solid Films journal homepage: www.el sevier.c om/l oc ate/ tsf Plasma-etching fabrication and properties of black silicon by using sputtered silver nanoparticles as micromasks Yanming Bi a, Xiaodong Su a,⁎, Shuai Zou a, Yu Xin a,⁎, Zhihua Dai a, Jie Huang b, Xusheng Wang a,b, Linjun Zhang a,b a Jiangsu Key Laboratory of Thin Films, Department of Physics, Soochow University, Suzhou 215006, PR China b Research and Development Center, Canadian Solar Inc., Suzhou 210093, PR China a r t i c l e i n f o a b s t r a c t Available online 8 January 2012 A nanohill structure has been fabricated on a silicon surface via a micromask formed by a radio-frequency