Pulsed Laser Deposition (PLD).ppt

* Pulsed Laser Deposition (PLD) Anne Reilly College of William and Mary Department of Physics Outline 1. Thin film deposition 2. Pulsed Laser Deposition a) Compared to other growth techniques b) Experimental Setup c) Advantages and Disadvantages 3. Basic Theory of PLD 4. Opportunities Thin Film Deposition Transfer atoms from a target to a vapor (or plasma) to a substrate Thin Film Deposition Transfer atoms from a target to a vapor (or plasma) to a substrate After an atom is on surface, it diffuses according to: D=Doexp(-eD/kT) eD is the activation energy for diffusion ~ 2-3 eV kT is energy of atomic species. Want sufficient diffusion for atoms to find best sites. Either use energetic atoms, or heat the substrate. target substrate Evaporation (Molecular beam epitaxy-MBE) Ways to deposit thin films target substrate Chemical vapor deposition-CVD Ar+ substrate gas Sputtering Low energy deposition (MBE): ~0.1 eV may get islanding unless you pick right substrate or heat substrate to high temperatures High energy deposition (Sputtering ~ 1 eV) smoother films at lower substrate temperatures, but may get intermixing Low energy deposition (MBE): ~0.1 eV may get islanding unless you pick right substrate or heat substrate to high temperatures High energy deposition (Sputtering ~ 1 eV) smoother films at lower substrate temperatures, but may get intermixing CCD /PMT spectrometer Target Substrates or Faraday cup laser beam Pulsed Laser Deposition CCD /PMT spectrometer Target Substrates or Faraday cup laser beam Pulsed Laser Deposition Target: Just about anything! (metals, semiconductors…) Laser: Typically excimer (UV, 10 nanosecond pulses) Vacuum: Atmospheres to ultrahigh vacuum Advantages of PLD Flexible, easy to implement Growth in any environment Exact transfer of complicated materials (YBCO) Variable growth rate Epitaxy at low temperature Resonant interactions possible (i.e., plasmons in metals, absorption peaks in dielectrics and sem