可见光响应型窄带隙半导体光催化材料的研究及应用进展.pdfVIP

·24· 材料导报：综述篇 可见光响应型窄带隙半导体光催化材料的研究及应用进展 张彤，张悦炜，张世著，陈冠钦，洪樟连 (浙江大学材料科学与工程学系，杭州310027) 摘要 近年来，窄带隙半导体材料因具有吸收太阳光可见波段能量、可见光催化降解有机物及可见光解水制 氢的优异特性而成为新型半导体材料的研发热点。综述了以Ti02为代表的传统半导体材料掺杂体系以及全新组成 材料体系等两大类具有窄带隙半导体特性的材料种类、光催化性能的影响因素、材料制备工艺以及应用前景，并在此 基础上展望了研究与发展方向。 关键词 窄带隙半导体可见光催化可见光解水带隙制备工艺 Researchand ofVisible NarrowBand ApplicationsLightResponsive Semiconductor Materials Gap Photocatalytic ZHANG Yuewei，ZHANGShizhu，CHEN Tong，ZHANG Guanqin，HONGZhanglian ofMaterialsScienceand (Department 310027) Engineering，ZhejiangUniversity，Hangzhou AbstractInrecent band semiconductorshaveattractedextensiveattentionandbecomethe years，narrowgap researchfocusofthenovel materialsbecauseare the semiconductor of visible they capableabsorbing light，degrading the and clean thewaterinto and undervisible organicpollutantsproducingenergybysplitting hydrogenoxygen light irradiation．Inthis thematerial the paper classification，factorscontrolling photocatalyticperformance，materialsyn- thesis andfuture oftWOkindsofmaterialswithnarrowband modifiedtitania technique application gapcharacters，the andnewnarrowbandsemiconductorare trendoftheirresearchand gap summarized．Finally，thedevelopment applica- tioniSalto discussed． wordsnarrowband