氮化铝薄膜的光学性质_英文_.pdf

· 616 · 2007 35 5 Vol. 35 No. 5 2 0 0 7 5 JOURNAL OF THE CHINESE CERAMIC SOCIETY M a y 2 0 0 7 1 1 1 2 1 1 (1. 2. 518060) (AlN) X // AlN 25 1.872.20 AlN 100AlN AlN 200300 nm 3001000nm (427 nm) (425 nm) O484.4 A 0454–5648(2007)05–0616–03 OPTICAL PROPERTIES OF ALUMINUM NITRIDE THIN FILM 1 1 1 2 1 1 LIU Wen WANG Zhiwu YANG Qingdou LIU Yi WEI Jingting Tang Weiqun (1. Institute of Optoelectronics, Shenzhen University, Key Laboratory of Optoelectronic Devices and Systems, Guangdong Province, Key Laboratory of Optoelectronic Devices and Systems, Ministry of Education; 2. Teachers College, Shenzhen University, Shenzhen 518060, China) Abstract: The structure and optical properties of aluminum nitride thin film deposited on quartz substrate by using a direct current magnetron reactive sputtering system were studied by X-ray diffraction, spectroscopic ellipsometry and ultraviolet-visible spectrometry. The refractive index and absorption coefficient of the AlN film were determined by fitting the experimental data and the dispersion rela- tionship of index and wavelength was obtained. The refractive index of the film is 1.872.20 in the wavelength range from 250 nm to 1000 nm. The AlN film has an excellent preferred (100) orientation structure, intense absorption in