berkley_半导体工艺讲义08--离子注入.pdfVIP

EE143 F05 Lecture 8 1) Implant Profile depends only on incident ion momentum, NOT on charge state A+ Same Same implant A momentum profile A- Note : Kinetic Energy = (momentum)2 /2M 2) Charge carried by ions will be neutralized by charges in the substrate after implantation. 3) n, p, Nd+, Na- charges in semiconductors are caused by the chemistry of the implanted