各种等离子体源评述.pdfVIP

Home Search Collections Journals About Contact us My IOPscience Plasma generation and plasma sources This article has been downloaded from IOPscience. Please scroll down to see the full text article. 2000 Plasma Sources Sci. Technol. 9 441 (/0963-0252/9/4/301) View the table of contents for this issue, or go to the journal homepage for more Download details: IP Address: 20 The article was downloaded on 23/04/2010 at 09:54 Please note that terms and conditions apply. Plasma Sources Sci. Technol. 9 (2000) 441–454. Printed in the UK PII: S0963-0252(00)17858-2 Plasma generation and plasma sources H Conrads and M Schmidt ¨ INP Greifswald, Institut fur Niedertemperatur-Plasmaphysik e.V., Friedrich Ludwig-Jahn-Str. 19, D-17489 Greifswald, Germany Received 1 October 1999, in final form 27 September 2000 Abstract. This paper reviews the most commonly used methods for the generation of plasmas with special emphasis on non-thermal, low-temperature plasmas for technological applications. We also discuss various technical realizations of plasma sources for selected applications. This paper is further limited to the discussion of plasma generation methods that employ electric fields. The various plasmas described include dc glow discharges, either operated continuously (CW) or pulsed, capacitively and inductively coupled rf discharges, helicon discharges, and microwave discharges. Various examples of technical realizations of plasmas in closed structures (cavities), in open structures (surfatron, planar plasma source), and in magnetic fields (electron cyclotron resonance sources) are discussed in detail. Finally, we mention dielectric barrier discharges as convenient sources of non-thermal plasmas at high pressures (up to atmospheric pressure) and beam-produced pla